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Title: Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
Authors: Kunte, Girish V
Advisors: Umarji, A M
Shivashankar, S A
Keywords: Vapour Pressure Deposition
Vacuum Deposition
Thin Film Deposition
Titanium Oxide Deposition
Atomic Layer Deposition (ALD)
Metalorganic Complexes - Synthesis
Titanium Oxide Thin Films
Titanium Oxides - Properties
Titanium Oxide Magneli Phases
Chemical Vapour Deposition (CVD)
Titanium Precursors
Vapour Pressure Determination
Vapour Pressure
Submitted Date: Sep-2008
Series/Report no.: G22463
Abstract: This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for the high-k dielectric gate oxide layer for CMOS devices in microelectronic circuits. The Magnéli phases of titanium oxide are difficult to grow and stabilize, especially in the thin film form, and have useful properties. The thin film deposition of oxides by CVD/ALD requires suitable precursors, which are often metalorganic complexes. The estimation of vapour pressure using thermogravimetry is described, and employed, using an approach based on the Langmuir equation. This data is important for the evaluation of the suitability of these complexes as CVD precursors. The first chapter gives a brief introduction to the topics that will be discussed in this thesis. Part one of the thesis deals with the synthesis, characterization, and studies of the vapour pressure and partial pressures of the precursors for CVD. This part comprises of the second, third and fourth chapter. The second chapter deals with the synthesis and characterization of the various metalorganic complexes that have been synthesized and characterized to evaluate their suitability as precursors for CVD. The third chapter describes the derivation of vapour pressure of precursors for CVD and ALD, from rising temperature thermogravimetric analysis (TGA) data, using the Langmuir equation. The fourth chapter deals with the determination of partial pressure of CVD precursors using data from low-pressure thermogravimetry. Part Two of the thesis reports the deposition of titanium oxide thin films by ALD, and the detailed investigation of their properties, for application as high-k dielectric materials. Chapters five, six and seven constitute this part. The fifth chapter deals with the deposition of titanium oxide thin films by ALD. Chapter six describes the electrical characterization of the thin films of titanium oxide, for applications as high-k dielectric gate oxide layers for CMOS circuits. In the seventh chapter, the deposition of Magnéli phases of titanium by ALD is described. The dielectric properties of the films are studied.
URI: http://hdl.handle.net/2005/762
Appears in Collections:Materials Research Centre (mrc)

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